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Tipus A
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Codi |
Competències Específiques |
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Recerca |
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Tipus B
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Codi |
Competències Transversals |
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Recerca |
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Tipus C
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Codi |
Competències Nuclears |
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Recerca |
| Objectius |
Competències |
| The general goal of the course is to provide the students with the basic knowledge of the fabrication processes with resolution in the nanometre scale, presenting their main fields of use and emphasising advantages and disadvantages of each of them. |
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| Tema |
Subtema |
| Chapter 0. |
Introduction and preliminary concepts. |
| Chapter 1. Visible and ultraviolet lithography. |
Concept of optical lithography. Conventional optical lithography. Resists. Equipment. Microelectronics as driving force for miniaturization. Limits of optical lithography. Advanced optical lithography. |
Chapter 2. Electron-beam lithography.
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Introduction to Electron Beam Lithography. Electron Optics: EBL Systems. Electron-Solid Interactions. Exposure: Resists. Proximity effects. Process Technology. Applications. |
| Chapter 3. Nanofabrication with polymers. |
Polymer availability for top-down lithography. Bottom-up lithography with polymers. Block-copolymers. Fabrication of polymer nanostructures. |
Chapter 4. Focused ion-beam technology.
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Polymer availability for top-down lithography. Bottom-up lithography with polymers. Block-copolymers. Fabrication of polymer nanostructures. |
| Chapter 5. Non-conventional lithographic techniques. |
Lithographies based on near field microscopies: Introduction to Scanning Probe Microscopy. Summary of Scanning Probe Lithography Methods. Atomic manipulation (STM). Manipulation of objects and molecules. Indentation/Local deposition. Local oxidation nanolithography. Local dispensing of liquids and molecules (including Dip Pen nanolithography). Parallel nanofabrication.
Interference or holographic lithography.
Embossing lithographies: Hot embossing and nanoimprinting.
Soft lithographies. |
| Chapter 6. Non-lithographic nanofabrication methods. |
Fabrication of nanotemplates. Growth inside the templates. Self-assembling of molecules and crystals. Synthesis of nanotubes, nanowires, nanobelts and nanoparticles. |
Chapter 7. Growth and deposition techniques.
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Process of growth. Evaporation. Molecular beam epitaxy. Sputtering. Ion-assited deposition. Laser ablation. Chemical phase deposition. Plasma-assisted deposition. Langmuir-Blodgett deposition method. |
| Chapter 8. Processing of layers. |
Wet and dry chemical etching. Lift-off processes. Plasma assisted and reactive etching. Ionic etching. |
| Chapter 9. |
Examples. |
| Metodologies :: Proves |
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Competències |
(*) Hores a classe |
Hores fora de classe |
(**) Hores totals |
| Activitats Introductòries |
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0 |
0 |
0 |
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| Atenció personalitzada |
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0 |
0 |
0 |
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(*) En el cas de docència no presencial, són les hores de treball amb suport vitual del professor.
(**) Les dades que apareixen a la taula de planificació són de caràcter orientatiu, considerant l’heterogeneïtat de l’alumnat |
Metodologies
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Descripció |
| Activitats Introductòries |
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Descripció |
Pes |
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Altres comentaris i segona convocatòria |
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| Bàsica |
M.J. Madou, Fundamentals of microfabrication : the science of miniaturization. 2nd edition., CRC Press, 2002
B. Bushan et al., Springer Handbook of Nanotechnology, Springer, 2006
J.N. Helbert, Handbook of VLSI Microlithography - Principles, Tools, Technology and Applications. 2nd Edition., William Andrew Publishing/Noyes, 2001
H.S. Nalwa (editor), Encyclopedia of nanoscience and nanotechnology, American Scientific Publishers, 2004
Z. Cui, Micro-Nanofabrication: Technology and Applications, Springer Verlag, 2006
M. Ohring, Materials Science of Thin Films, Academic Press, 2002
J.A. Venables, Introduction to Surface and Thin Film Processes, Cambridge University Press, 2001
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| Complementària |
, Journals in the field of Nanotechnology, ,
, Applied Physics and Chemical Synthesis, ,
, Proceedings of conferences in the field of the course, ,
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