IDENTIFYING DATA 2008_09
Subject Code 175101207
Study programme
Enginyeria Electrònica (2006)
Cycle 2nd
Descriptors Credits Type Year Period
4 Optional Only annual
Language
Anglès
Castellà
Català
Department Eng. Electrònica, Elèctrica i Automàtica
Coordinator
VILANOVA SALAS, JAVIER
E-mail xavier.vilanova@urv.cat
Lecturers
VILANOVA SALAS, JAVIER
Web
General description and relevant information

Competences
Type A Code Competences Specific
  Professional
  Research
  AR1 Know the design, fabrication and verification processes employed in microelectronics in general and in MEMS in particular
  AR4 Evaluate different options for implementing a MEMS system and select the most appropriate according to the problem specifications
  AR6 Design and implement microsystems that meet fixed specifications
Type B Code Competences Transversal
  Common
  BC4 Sort problems out in an effective way
  BC11 Work in a team
  BC12 Assertivity. Communicate clearly and with no ambiguity both to expert and non-expert audiences
  BC14 Plan making and organisation
Type C Code Competences Nuclear
  Common
  CC1 Master the expression and comprehension of foreing languages
  CC2 Use of the specific Information and communications Technology tools
  CC4 Develop informational skills

Learning aims
Objectives Competences
To know the technological processess related to MEMS development AR1
AR4
To know how to combine the technological processes to achieve the desired structures AR1
AR4
AR6
BC4
BC11
BC14
To know how to describe a technological process BC12
BC14
CC1
CC2
CC4

Contents
Topic Sub-topic
Presentation
Introduction Microsystem definition ans structure. Clean room classification.
Microelectronics Technology Monocrystals obtention (wafers)
Oxidation processes
Doping processes
Deposition processes: Physical processes (PVD) and chemical processes(CVD)
Photolithographic processes
Etching processes: dry etchig and wet etching
Hybrid Technology The screen printing process
Available inks. How to prepare a ink
the drying process
The firing process
Micromachining processes Surface Micromachining
Bulk Micromachining
LIGA process Process Definition and Applications
Masks Obtention
Technological steps
Alternative processes
Interconnection and packaging "Wirebonding"
Tab-Bonding
Flip-Chip
Wafer Bonding

Planning
Methodologies  ::  Tests
  Competences (*) Class hours Hours outside the classroom (**) Total hours
Introductory activities
1 0 1
 
Lecture
25 50 75
Assignments
4 17 21
 
Personal tuition
1 0 1
 
Objective short-answer tests
2 0 2
 
(*) On e-learning, hours of virtual attendance of the teacher.
(**) The information in the planning table is for guidance only and does not take into account the heterogeneity of the students.

Methodologies
Methodologies
  Description
Introductory activities The subjects contents, learning aims and assesment procedures will be presented
Lecture The contents of the subject will be analysed and discussed.
Assignments Each group of students will have to define the technological processes to achieve a microsystem.
The students have to prepare an inform about the sequence of technological processes and a presentation for the class.

Personalized attention
 
Assignments
Personal tuition
Description
Doubts about contents exposed in the magistral sessions or related to the work assigned will be solved in the professors office after and appointment or by e-mail

Assessment
  Description Weight
Assignments The technological aspects of the work will be considered in the qualification.
The presentation and correcteness of the inform and oral presentation will be considered in the qualification.
40 %
Objective short-answer tests Two test will be performed during the semester in order to check if the students are understanding the technological processes described during the course. 2 x 30 %
 
Other comments and second exam session

Sources of information

Basic W. Menz, J. Mohr, O. Paul, Microsystem Technology, Wiley-VCH, 2001
Hsu, Tai-Ran, MEMS and Microsystems, McGraw-Hill, 2002

Complementary H.J. Levinson, Principles of Lithography, SPIE press, 2005
M. Köhler, Etching in Microsystem Technology, Wiley-VCH, 1999

Recommendations


 
Other comments
Es recamana haver cursat Materials Electrònics, Sensors i Actuadors i Física de Semiconductors