IDENTIFYING DATA

2011_12

Subject (*)

NANOFABRICATION AND NANOPROCESSING

Code

20635261

Study programme

Nanoscience and Nanotechnology (2010)

Cycle

2nd

Descriptors

Credits

Type

Year

Period

Optional

Only annual

Language

Anglès

Department

Química Analítica i Química Orgànica

Coordinator

RIUS FERRÚS, FRANCISCO JAVIER

E-mail

fxavier.rius@urv.cat

Lecturers

RIUS FERRÚS, FRANCISCO JAVIER

Web

General description and relevant information

The general goal of the course is to provide the students with the basic knowledge of the fabrication processes with resolution in the nanometre scale, presenting their main fields of use and emphasising advantages and disadvantages of each of them.

Competences

Type A	Code	Competences Specific
		Research
	AR22	Understanding the basic principles employed in the field of Nanofabrication and Nanoprocessing of materials, and the main techniques used in this area in order to select the most appropriate nanofabrication methods to solve specific problems in nanotechnology.
Type B	Code	Competences Transversal
		Research
	BR7	Treball en equip
Type C	Code	Competences Nuclear
		Common
	CC3	Communicating effectively as a professional and as a citizen
	CC4	Speaking and understanding a foreign language with complete ease and fluency
	CC7	Communicating with experts from other professional fields

Learning aims

Objectives	Competences
To understand the basic principles employed in the field of nanofabrication and nanoprocessing of materials, and the main techniques used in this area in order to select the most appropriate nanofabrication methods to solve specific problems in nanotechnology.	AR22	BR7	CC3 CC4 CC7

Contents

Topic	Sub-topic
Chapter 0.	Introduction and preliminary concepts.
Chapter 1. Visible and ultraviolet lithography.	Concept of optical lithography. Conventional optical lithography. Resists. Equipment. Microelectronics as driving force for miniaturization. Limits of optical lithography. Advanced optical lithography.
Chapter 2. Electron-beam lithography.	Introduction to Electron Beam Lithography. Electron Optics: EBL Systems. Electron-Solid Interactions. Exposure: Resists. Proximity effects. Process Technology. Applications.
Chapter 3. Nanofabrication with polymers.	Polymer availability for top-down lithography. Bottom-up lithography with polymers. Block-copolymers. Fabrication of polymer nanostructures.
Chapter 4. Focused ion-beam technology.	Polymer availability for top-down lithography. Bottom-up lithography with polymers. Block-copolymers. Fabrication of polymer nanostructures.
Chapter 5. Non-conventional lithographic techniques.	Lithographies based on near field microscopies: Introduction to Scanning Probe Microscopy. Summary of Scanning Probe Lithography Methods. Atomic manipulation (STM). Manipulation of objects and molecules. Indentation/Local deposition. Local oxidation nanolithography. Local dispensing of liquids and molecules (including Dip Pen nanolithography). Parallel nanofabrication. Interference or holographic lithography. Embossing lithographies: Hot embossing and nanoimprinting. Soft lithographies.
Chapter 6. Non-lithographic nanofabrication methods.	Fabrication of nanotemplates. Growth inside the templates. Self-assembling of molecules and crystals. Synthesis of nanotubes, nanowires, nanobelts and nanoparticles.
Chapter 7. Growth and deposition techniques.	Process of growth. Evaporation. Molecular beam epitaxy. Sputtering. Ion-assited deposition. Laser ablation. Chemical phase deposition. Plasma-assisted deposition. Langmuir-Blodgett deposition method.
Chapter 8. Processing of layers.	Wet and dry chemical etching. Lift-off processes. Plasma assisted and reactive etching. Ionic etching.
Chapter 9.	Examples.

Planning

Methodologies :: Tests

Competences

(*) Class hours

Hours outside the classroom

(**) Total hours

Introductory activities

Lecture

Presentations / expositions

Assignments

Personal tuition

Objective multiple-choice tests

(*) On e-learning, hours of virtual attendance of the teacher.
(**) The information in the planning table is for guidance only and does not take into account the heterogeneity of the students.

Methodologies

Methodologies

	Description
Introductory activities	Presentation of the lecturers. Presentation of the course: its objectives, contents, bibliography, evaluation forms, etc..
Lecture	Presentation of the contents of the subject by the lecturers. Frequently asking questions to the students in order to promote their active role in class.
Presentations / expositions	Presentation and public defence in class of a paper written by students either individually or in group.
Assignments	Working in depth a topic by the student. These works have a direct relationship with the content taught in the class sessions.

Personalized attention

Personal tuition

Description

Meetings with students either individually or in small groups to answer questions, indicate areas of improvement and guide the overall development of the subject

Assessment

	Description	Weight
Presentations / expositions	Presentation and public defence in class of a paper written by students either individually or in group.	40
Assignments	Working in depth a topic by the student. These works have a direct relationship with the content taught in the class sessions.	40
Objective multiple-choice tests	Rapid tests to verify that the student has acquired some specific aspects of the subject.	20

Other comments and second exam session

Sources of information

Basic	M.J. Madou, Fundamentals of microfabrication : the science of miniaturization. 2nd edition., CRC Press, 2002 B. Bushan et al., Springer Handbook of Nanotechnology, Springer, 2006 J.N. Helbert, Handbook of VLSI Microlithography - Principles, Tools, Technology and Applications. 2nd Edition., William Andrew Publishing/Noyes, 2001 H.S. Nalwa (editor), Encyclopedia of nanoscience and nanotechnology, American Scientific Publishers, 2004 Z. Cui, Micro-Nanofabrication: Technology and Applications, Springer Verlag, 2006 M. Ohring, Materials Science of Thin Films, Academic Press, 2002 J.A. Venables, Introduction to Surface and Thin Film Processes, Cambridge University Press, 2001

Complementary	, Journals in the field of Nanotechnology, , , Applied Physics and Chemical Synthesis, , , Proceedings of conferences in the field of the course, ,

Recommendations

(*)The teaching guide is the document in which the URV publishes the information about all its courses. It is a public document and cannot be modified. Only in exceptional cases can it be revised by the competent agent or duly revised so that it is in line with current legislation.