IDENTIFYING DATA 2010_11
Subject (*) CLEAN ROOM TRAINING Code 205151206
Study programme
Nanoscience and Nanotechnology (2006)
 Cycle 2nd
Descriptors Credits Type Year Period
2.5 Optional Only annual
Language
Català
Department Química Analítica i Química Orgànica
Coordinator
ANDRADE ., FRANCISCO JAVIER
 E-mail franciscojavier.andrade@urv.cat
Lecturers
ANDRADE ., FRANCISCO JAVIER
Web
General description and relevant information To design and fabricate metallic nanostructures in a clean room. Subsequently, they will be electrically and microscopically characterised.

Competences
Type A Code Competences Specific
  Research
  AR9 Recognizing how specific physical properties can arise from the structure of the molecular materials and from the intermolecular interactions that are established in their structure.
  AR10 Understanding and managing the concept of “clean room training” and the associated processes.
  AR11 Practical knowledge of the photolithography, etching, deposition, growth at high temperatures and nanolithography processes.
  AR12 Monitoring and characterizing processes.
Type B Code Competences Transversal
  Research
  BR2 Treballar de manera autònoma amb iniciativa.
  BR4 Capacitat d’organització i planificació.
  BR7 Teamwork.
Type C Code Competences Nuclear
  Common
  Research
  CR4 Tenir adquirides les competències bàsiques en TIC.
  CR5 Ability to communicate with experts of other professional fields.

Learning aims
Objectives Competences
Recognizing how specific physical properties can arise from the structure of the molecular materials and from the intermolecular interactions that are established in their structure. AR9
 BR2
BR4
BR7
 CR4
CR5
Understanding and managing the concept of “clean room training” and the associated processes. AR10
 BR2
BR4
BR7
 CR4
CR5
Practical knowledge of the photolithography, etching, deposition, growth at high temperatures and nanolithography processes. AR11
 BR2
BR4
BR7
 CR4
CR5
Monitoring and characterizing processes. AR12
 BR2
BR4
BR7
 CR4
CR5

Contents
Topic Sub-topic
Contents 1.- Introduction to Clean Room Processing
2.- Processes for fabrication of nanostructures
3.- Mask design (practical work)
4.- Processing of nanostructures (practical work)
5.- Characterization

Planning
Methodologies  ::  Tests
  Competences (*) Class hours Hours outside the classroom (**) Total hours
Introductory activities
1 0 1
 
Lecture
2 4 6
Assignments
9 36 45
 
Personal tuition
8 0 8
 
Practical tests
2 0 2
 
(*) On e-learning, hours of virtual attendance of the teacher.
(**) The information in the planning table is for guidance only and does not take into account the heterogeneity of the students.

Methodologies
Methodologies
  Description
Introductory activities
Three introductory sessions to work with the fundamental concepts in this field.
Lecture The lecturer will present the contents of the course. He will often ask questions to the students so that they take an activerole in class.
Assignments
After each session, students will have to deliver a report:
1.- After sessions 2), the students must work on the design of the structure and the fabrication process. They will have to use the bibliographical references recommended.
2.- After sessions 5) the students must write a report on the design.
3.- After sessions 8)) the students must submit a report on the ‘micro’ fabrication
4.- At the end of the course, the students must submit an overall report.

Personalized attention
 
Personal tuition
Description
Meetings with students either individually or in small groups to answer questions, indicate areas of improvement and guide the overall development of the subject.

Assessment
  Description Weight
Assignments After each session, students will have to deliver a report:
1.- After sessions 2), the students must work on the design of the structure and the fabrication process. They will have to use the bibliographical references recommended.
2.- After sessions 5) the students must write a report on the design.
3.- After sessions 8)) the students must submit a report on the ‘micro’ fabrication
4.- At the end of the course, the students must submit an overall report. 		70
Practical tests This subject has a clear practical character. There will be a test of its kind to demonstrate the acquired knowledge and skills. 30
 
Other comments and second exam session

Sources of information

Basic
  • M.J. Madou: Fundamentals of microfabrication : the science of miniaturization. 2nd edition, CRC Press, cop. 2002.

 

  • B. Bushan et al.: “Springer Handbook of Nanotechnology”, Springer, 2006, ISBN: 3-540-29855-X.

 

  • J.N. Helbert: Handbook of VLSI Microlithography - Principles, Tools, Technology and Applications. 2nd Edition, William Andrew Publishing/Noyes  2001.

 

  • Z. Cui: “Micro-Nanofabrication: Technology and Applications”, Springer Verlag, 2006, ISBN: 3-540-28922-4.

 

  • M. Ohring: “Materials Science of Thin Films, Academic Press, 2002, ISBN: 0-12-524975-6.

 

  • J.A. Venables: Introduction to Surface and Thin Film Processes, Cambridge University Press, 2001, ISBN: 0-521-78500-6.

 
Complementary

Recommendations


 
Other comments
It is necessary to have taken during the first term the Nanofabrication and Nanoprocessing course.
(*)The teaching guide is the document in which the URV publishes the information about all its courses. It is a public document and cannot be modified. Only in exceptional cases can it be revised by the competent agent or duly revised so that it is in line with current legislation.